Removable liner design for plasma immersion ion implantation
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چکیده
A plasma treatment system (200) for implantation with a novel susceptor with a silicon coating (203). The system (200) has a variety of elements such as a chamber, which can have a silicon coating formed thereon, in which a plasma is generated in the chamber. The system (200) also has a susceptor disposed in the chamber to support a silicon substrate. The silicon coating reduces nonsilicon impurities that may attach to the silicon substrate. The system (200) also includes a silicon liner, which is used to line inner portions of the chamber walls. References Cited [Referenced By] U.S. Patent Documents United States Patent 6,120,660 Chu , et al. September 19, 2000 Inventors: Chu; Paul K. (Kowloon, HK), Chan; Chung (Newton, MA) Assignee: Silicon Genesis Corporation (Campbell, CA) Appl. No.: 09/216,035 Filed: December 18, 1998 Current U.S. Class: 204/298.15 ; 118/723I; 118/723MP; 118/728; 118/733; 156/345.48; 204/298.02; 204/298.04; 204/298.05; 204/298.11; 204/298.26 Current International Class: C23C 14/50 (20060101); C23C 16/507 (20060101); C23C 14/56 (20060101); C23C 16/44 (20060101); C23C 16/50 (20060101); C23C 16/458 (20060101); H01J 37/32 (20060101); C23C 016/00 (); C23C 016/458 (); C23C 014/50 (); C23C 014/34 () Field of Search: 204/298.02,298.04,298.05,298.06,298.15,298.11,192.11,192.12,192.23 118/728,733,723I,723MP 427/523,527,585,569,578 4764394 August 1988 Conrad 4808546 February 1989 Moniwa et al. 4933063 June 1990 Katsura et al. 5032202 July 1991 Tsai et al. 5183775 February 1993 Levy Page 1 of 12 United States Patent: 6120660
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